Περίληψη σε άλλη γλώσσα
As polysiloxanes combine unique physical and chemical properties they have found nowadays wide scientific and technological interest. The most well studied member of this class of materials is poly(dimethylsiloxane) (PDMS). As a result of its excellent thermal and oxidative stability, low absorption in UV, and good oxygen reactive ion etch resistance, PDMS is widely used in lithographic applications for microelectronics. In addition, PDMS shows high chain flexibility, low glass transition temperature, low surface energy, and low solubility parameter. These properties render PDMS-based materials very attractive in a variety of industrial areas. Therefore, the synthesis of well defined homo- and copolymers of dimethylsiloxane with different architectures is of major importance for designing new materials. Until now, anionic polymerization high vacuum techniques combined with appropriate linking chemistry have been the most powerful tool for synthesizing polymers of complex macromolecular ...
As polysiloxanes combine unique physical and chemical properties they have found nowadays wide scientific and technological interest. The most well studied member of this class of materials is poly(dimethylsiloxane) (PDMS). As a result of its excellent thermal and oxidative stability, low absorption in UV, and good oxygen reactive ion etch resistance, PDMS is widely used in lithographic applications for microelectronics. In addition, PDMS shows high chain flexibility, low glass transition temperature, low surface energy, and low solubility parameter. These properties render PDMS-based materials very attractive in a variety of industrial areas. Therefore, the synthesis of well defined homo- and copolymers of dimethylsiloxane with different architectures is of major importance for designing new materials. Until now, anionic polymerization high vacuum techniques combined with appropriate linking chemistry have been the most powerful tool for synthesizing polymers of complex macromolecular architectures. Unfortunately, anionic polymerization of hexamethylcyclotrisiloxane (D3), the usual monomer of PDMS, suffers from backbiting reactions, thus rendering the synthesis of PDMS copolymers with complex macromolecular architectures difficult or even impossible. Recently our group solved this problem, by a two-step protocol for the complete polymerization of D3 without side reactions. In this study, a series of novel three-arm A2B, A2C, and four-arm A2D2 miktoarm star polymers, as well as a series of H-shaped A2BD2 copolymers, where A is poly(dimethylsiloxane) (PDMS), B is polybutadiene (PBd), C is a linear triblock terpolymer PS-b-PI-b-P2VP and D is polystyrene (PS), where successfully synthesized via anionic polymerization techniques and the combination of chlorosilane and benzyl chloride linking chemistry. This new and general methodology is based on the linking reaction of in-chain benzyl chloride functionalized poly(dimethylsiloxane) {BzCl-(PDMS)2} with the living centers of PBd-DPH-Li+ or PS-b-PI-b-P2VP-Li+ or (PS)2-DPH-Li+ or (PS)2PBd-DPH-Li+. The precursor BzCl-(PDMS)2 of the already mentioned architectures was synthesized by the selective reaction of lithium PDMS enolate with the chlorosilane group of dichloro[4-(chloromethyl)phenylethyl](methyl)silane (CMPEMDS), leaving the benzyl chloride group intact. The combined molecular characterization results of size exclusion chromatography, membrane osmometry, 1H NMR and two-angle laser light scattering, revealed high degree of structural and compositional homogeneity in all, intermediate and final, products. Differential scanning calorimetry was also used in order to study the thermal behaviour of A2D2 miktoarm stars and A2BD2 H-shaped copolymers. Finally, the micellization properties of the H-shaped copolymers were studied in terms of dynamic and static light scattering in methylethylketone, leading to monomolecular micelles or micelles with degree of association 2.
περισσότερα